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KRYSTAL’s Fe-MEMS PZT is epitaxially formed on Si and SOI substrates, and measured by reciprocal space-mapping, dot-like patterns are created which is unlike typical uniaxially-oriented PZT.

The greatest feature of Fe-MEMS PZT is that it is polled immediately after film deposition and does not require a subsequent poling process. In addition, the film formation after heat treatment at 650℃, the poling state remains. It is particularly an advantage for low-voltage sensor applications.

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